Chemical Vapor Deposition Process

- Dec 02, 2019-

Chemical vapor deposition process

The chemical vapor deposition process is divided into three important stages: the reaction gas diffuses to the surface of the substrate, the reaction gas adsorbs on the surface of the substrate, a chemical reaction occurs on the surface of the substrate to form a solid deposit, and the gas phase by-products detach from the substrate surface. The most common chemical vapor deposition reactions are: thermal decomposition reactions, chemical synthesis reactions, and chemical transport reactions. Usually TiC or TiN is deposited by introducing TiCl4, H2, CH4 and other gases into the reaction chamber at 850 ~ 1100 ℃, and forming a coating on the surface of the substrate through chemical reaction.